Szkło powiększające
Search Loader

Michael A. Lieberman & Alan J. Lichtenberg 
Principles of Plasma Discharges and Materials Processing 

Wsparcie
A Thorough Update of the Industry Classic on Principles of Plasma
Processing

The first edition of Principles of Plasma Discharges and Materials
Processing, published over a decade ago, was lauded for its
complete treatment of both basic plasma physics and industrial
plasma processing, quickly becoming the primary reference for
students and professionals.

The Second Edition has been carefully updated and revised to
reflect recent developments in the field and to further clarify the
presentation of basic principles. Along with in-depth coverage of
the fundamentals of plasma physics and chemistry, the authors apply
basic theory to plasma discharges, including calculations of plasma
parameters and the scaling of plasma parameters with control
parameters.

New and expanded topics include:

* Updated cross sections

* Diffusion and diffusion solutions

* Generalized Bohm criteria

* Expanded treatment of dc sheaths

* Langmuir probes in time-varying fields

* Electronegative discharges

* Pulsed power discharges

* Dual frequency discharges

* High-density rf sheaths and ion energy distributions

* Hysteresis and instabilities

* Helicon discharges

* Hollow cathode discharges

* Ionized physical vapor deposition

* Differential substrate charging

With new chapters on dusty plasmas and the kinetic theory of
discharges, graduate students and researchers in the field of
plasma processing should find this new edition more valuable than
ever.
€172.99
Metody Płatności

Spis treści

1. Introduction.

2. Basic Plasma Equations and Equilibrium.

3. Atomic Collisions.

4. Plasma Dynamics.

5. Diffusion and Transport.

6. DC Sheaths.

7. Chemical Reactions and Equilibrium.

8. Molecular Collisions.

9. Chemical Kinetics and Surface Processes.

10. Particle and Energy Balance in Discharges.

11. Capacitive Discharges.

12. Inductive Discharges.

13. Wave-Heated Discharges.

14. DC Discharges.

15. Etching.

16. Deposition and Implantation.

17. Dusty Plasmas.

18. Kinetic Theory of Discharges.

Appendix A: Collision Dynamics.

Appendix B: The Collision Integral.

Appendix C: Diffusion Solutions for Variable Mobility Model.

O autorze

MICHAEL A. LIEBERMAN, Ph D, is Professor in the Graduate School in
Electrical Engineering at the University of California, Berkeley.
He has published more than 170 journal articles on the topics of
plasmas, plasma processing, and nonlinear dynamics. He has also
coauthored, with Professor Lichtenberg, Regular and Stochastic
Motion and Regular and Chaotic Dynamics, Second Edition.

ALLAN J. LICHTENBERG, Ph D, is Professor in the Graduate School
in Electrical Engineering at the University of California,
Berkeley. A respected pioneer in the fields of high-temperature
plasmas, plasma discharges, and nonlinear dynamics, he has
published about 150 articles in these areas. In addition to the
books coauthored with Professor Lieberman, he has written an
earlier monograph Phase-Space Dynamics of Particles (Wiley).
Język Angielski ● Format PDF ● Strony 800 ● ISBN 9780471724247 ● Rozmiar pliku 7.8 MB ● Wydawca John Wiley & Sons ● Opublikowany 2005 ● Ydanie 2 ● Do pobrania 24 miesięcy ● Waluta EUR ● ID 2329086 ● Ochrona przed kopiowaniem Adobe DRM
Wymaga czytnika ebooków obsługującego DRM

Więcej książek elektronicznych tego samego autora (ów) / Redaktor

18 073 Ebooki w tej kategorii